Semiconductor
Solution

Providing Zero-Contamination Assurance for Nanometer-Level Processes, Complete Cleanliness Solutions from Wafer to Final Test

5/5

bupclean

One-stop industry service

15 years experience

Ultra-Clean Process Wiping System for Semiconductor Manufacturing

Process StepRecommended ProductKey Technical ParametersApplication ScenarioPackaging Spec
Lithography Area CleaningBN.11040324233.93% Abs., 18.7g Dry Wt., Ultra-low IonsReticle Cleaning, Lens Wiping, Scanner Interior10 pcs/bag, 100 bags/case
Post-CMP CleaningBN.11040218254.25% Abs., 54.2g Dry Wt., Abrasion-ResistantPost-polish wafer surface cleaning, Pad cleaningRoll, 100m/roll
Ion Implantation AreaBN.11050805ESD Safe, 10⁶ Ω Surface Resistivity, Radiation-ResistantImplanter chamber cleaning, Wafer transfer mechanism20 pcs/bag, 50 bags/case
Thin Film Deposition AreaBN.11050135Low Ionic Residue, NVR < 3 μg/cm²CVD/PVD equipment cleaning, Reaction chamber maintenanceCustom Sizes, Packaging on Demand
Etch Process AreaBN.11051103Composite Structure, Acid/Alkali Resistant, 221.01% Abs.Etch tool cleaning, Exhaust treatment system25 pcs/bag, 40 bags/case
Assembly & Test AreaBN.11050207Balanced Performance, 178.31% Abs., Cost-EffectiveMold cleaning, Test socket maintenance100 pcs/bag, 20 bags/case

Company Partners

Reliable Guarantee Customer case feedback

4.9/5

Dr. Rachel Haldims

Solving a 5nm wafer defect problem

Surface charge decreased from 250V to <50V, and defect rate decreased from 12% to 1.8%.

5/5

Dr. Mariel Senry

Static electricity damage and lint can cause short circuits.

The electrostatic discharge (ESD) failure rate decreased from 8% to 0.6%, and the short circuit rate decreased from 5% to 0.3%.

4.8/5

Dr. Damian Pix

Optical equipment lens maintenance

No new scratches, charge maintained at <30V for over 8 hours, and imaging resolution improved by 15%.

4.5/5

Dr. Shi Yon

Wafer surface particulate contamination

The surface particulate contamination rate of wafers decreased by 70%, and the overall yield increased by 5%.

Microfiber cleanroom cloth

In the nanoscale world of semiconductor manufacturing, contamination control is not an option, but a necessity. Our microfiber cleanroom wipes, designed specifically for global semiconductor front-end manufacturing and precision back-end assembly, serve as a line of defense against particulate contamination, protecting sensitive circuitry and ensuring the highest product yields. Each wipe originates from our certified ISO Class 4 core production environment, manufactured and tested according to the most stringent IEST standards, and is committed to meeting the demanding requirements from mature processes to state-of-the-art packaging technologies such as 3D-ICs.

Our microfiber wipers are engineered for the most critical environments. The key is our continuous filament, 100% polyester microfiber construction which is inherently low-linting. Combined with our proprietary laser-sealing edge technology, we virtually eliminate edge shedding. Each batch is validated to release < 5 particles (>0.5µm) per square foot according to IEST-RP-CC004.3, making them ideal for photolithography, wafer inspection, and sensitive assembly areas.

Our microfiber is designed for high absorbency with low NVR (Non-Volatile Residue). The split-fiber structure creates immense surface area to trap and retain contaminants and liquids within the fabric, rather than redepositing them. When used with high-purity solvents like IPA or acetone, our wipers consistently achieve NVR levels below 10 µg/ft² in standard tests. We recommend validating with your specific solvent in a controlled test.

  • Size & Format: We can produce any roll dimensions, sheet size, or specialized die-cut shapes to fit your equipment.
  • Packaging: Options include vacuum-sealed bags, clean PE pouches, or bulk packaging for automated dispensers, all in Class 100 cleanrooms.
  • ESD Properties: We can embed permanent carbon-loaded fibers or apply topical treatments to achieve a consistent surface resistivity range from 10^6 to 10^9 ohms/sq, complete with full per-batch test data.
  • Raw Material Control: Incoming fiber certification.
  • In-process Checks: SPC (Statistical Process Control) on knitting, sewing, and cleaning.
  • Final Batch Testing: Each batch is sampled and tested for particles, NVR, and ESD in our in-house lab. We provide full Certificate of Analysis (CoA) and Compliance (CoC).
    We fully support customer audits (virtual or on-site) and provide all necessary documentation for your supplier qualification portal.