New energy battery manufacturing
Solution

High-Purity Cleaning System for New Energy Battery Manufacturing,Precision Contamination Control for Lithium-ion, Solid-State, and Fuel Cell Production from Electrode to Assembly

5/5

bupclean

One-stop industry service

15 years experience

New Energy Battery Manufacturing Solutions

Battery Manufacturing StageCritical Cleaning NeedRecommended ProductWhy This Product?Application Guidance
1. Electrode Fabrication    
Mixing & CoatingSlurry splash, dust on equipmentBN.11050422 (220 GSM)High abrasion resistance removes dried slurry; low moisture; can be used dry or with limited solvent.Use dry or lightly dampened with deionized water for equipment surfaces. Avoid solvent near wet coating area.
CalenderingMetal dust (Al/Cu) from electrodesBN.11050805 (ESD)Conductive fibers help dissipate static that attracts dust; durable for metal debris.Ground operator and wipe. Use in figure-8 motion on rollers.
Slitting & Die-CuttingMicro burrs, cutting debrisBN.11050135 (Low Residue)Low linting prevents new contamination; fine fiber captures micro-particles.Use with gentle pressure to avoid embedding debris.
2. Cell Assembly    
Stacking/WindingGeneral dust, fingerprint removalBN.11050201 (105 GSM)Soft, lightweight prevents damage to fragile jellyrolls/electrode stacks; cost-effective for high-volume use.Use in dry room with minimal IPA if allowed. One-directional wipes.
Tab WeldingSoot, spatter from laser/weldingBN.11050312 (200 GSM)Robust construction withstands abrasive soot; good absorption for cleaning agents.Dampen with approved cleaner to dissolve soot before wiping.
Electrolyte FillingSpills, drips, overflowBN.11040218 (254% Abs.)CHAMPION ABSORBER. Highest absorption rate for rapid spill control; chemically compatible.Keep pre-positioned at filling stations. Change immediately after saturation.
3. Formation & Finishing    
FormationElectrolyte seepage, minor gassing residueBN.11050137 (160 GSM)Balanced durability & absorption; good for repeated cleaning of formation trays and cell surfaces.Use with diluted mild alkaline cleaner for neutralization.
Degassing (Pouch)Residual electrolyte around seal areaBN.11040324 (Ultra-Soft)Ultra-soft, low-lint safe for cleaning sensitive sealing areas without leaving fibers.Use with high-purity ethanol.
Module/Pack AssemblyGeneral cleaning, thermal paste smearsBN.11050207 (General Purpose)Excellent value, versatile for final external cleaning before shipping.Standard IPA or ethanol.

Company Partners

Reliable Guarantee Customer case feedback

4.9/5

Dr. Rachel Haldims

Solving a 5nm wafer defect problem

Surface charge decreased from 250V to <50V, and defect rate decreased from 12% to 1.8%.

5/5

Dr. Mariel Senry

Static electricity damage and lint can cause short circuits.

The electrostatic discharge (ESD) failure rate decreased from 8% to 0.6%, and the short circuit rate decreased from 5% to 0.3%.

4.8/5

Dr. Damian Pix

Optical equipment lens maintenance

No new scratches, charge maintained at <30V for over 8 hours, and imaging resolution improved by 15%.

4.5/5

Dr. Shi Yon

Wafer surface particulate contamination

The surface particulate contamination rate of wafers decreased by 70%, and the overall yield increased by 5%.

Microfiber cleanroom cloth

In the nanoscale world of semiconductor manufacturing, contamination control is not an option, but a necessity. Our microfiber cleanroom wipes, designed specifically for global semiconductor front-end manufacturing and precision back-end assembly, serve as a line of defense against particulate contamination, protecting sensitive circuitry and ensuring the highest product yields. Each wipe originates from our certified ISO Class 4 core production environment, manufactured and tested according to the most stringent IEST standards, and is committed to meeting the demanding requirements from mature processes to state-of-the-art packaging technologies such as 3D-ICs.

Our microfiber wipers are engineered for the most critical environments. The key is our continuous filament, 100% polyester microfiber construction which is inherently low-linting. Combined with our proprietary laser-sealing edge technology, we virtually eliminate edge shedding. Each batch is validated to release < 5 particles (>0.5µm) per square foot according to IEST-RP-CC004.3, making them ideal for photolithography, wafer inspection, and sensitive assembly areas.

Our microfiber is designed for high absorbency with low NVR (Non-Volatile Residue). The split-fiber structure creates immense surface area to trap and retain contaminants and liquids within the fabric, rather than redepositing them. When used with high-purity solvents like IPA or acetone, our wipers consistently achieve NVR levels below 10 µg/ft² in standard tests. We recommend validating with your specific solvent in a controlled test.

  • Size & Format: We can produce any roll dimensions, sheet size, or specialized die-cut shapes to fit your equipment.
  • Packaging: Options include vacuum-sealed bags, clean PE pouches, or bulk packaging for automated dispensers, all in Class 100 cleanrooms.
  • ESD Properties: We can embed permanent carbon-loaded fibers or apply topical treatments to achieve a consistent surface resistivity range from 10^6 to 10^9 ohms/sq, complete with full per-batch test data.
  • Raw Material Control: Incoming fiber certification.
  • In-process Checks: SPC (Statistical Process Control) on knitting, sewing, and cleaning.
  • Final Batch Testing: Each batch is sampled and tested for particles, NVR, and ESD in our in-house lab. We provide full Certificate of Analysis (CoA) and Compliance (CoC).
    We fully support customer audits (virtual or on-site) and provide all necessary documentation for your supplier qualification portal.